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Sapphire crystal growth furnace thermal field: large size manufacturing capacity.
| Diameter | Length | Purity | Density | Service temp | Vapor pressure | blackness | Coefficient of thermal expansion | 
| 3-100mm | 3~3000mm | 99.95% | 19.2g/cm3 min. | 3400 ℃ | 10-6 Pa | 0.295 | 4.98*10-6 | 
High melting point (3410°C)
Low thermal expansion
High electrical resistance
Low vapour pressure
Good thermal conductivity
High density
| Atomic number | 74 | 
| CAS number | 7440-33-7 | 
| Atomic mass | 183.84 [g/mol] | 
| Melting point | 3420 °C | 
| Boiling point | 5555 °C | 
| Density at 20 °C | 19.25 [g/cm3] | 
| Crystal structure | Body-centered cubic | 
| Coefficient of linear thermal expansion at 20 °C | 4.4 × 10-6 [m/(mK)] | 
| Thermal conductivity at 20 °C | 164 [W/(mK)] | 
| Specific heat at 20 °C | 0.13 [J/(gK)] | 
| Electrical conductivity at 20 °C | 18.2 × 106 [S/m] | 
| Specific electrical resistance at 20 °C | 0.055 [(Ωmm2)/m] | 

sapphire furnaces